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Barium Titanate sputtering target(BaTiO3)
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Barium Titanate sputtering target(BaTiO3)

Barium Titanate (BaTiO3)
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Description

Barium Titanate Sputtering target - BaTiO3 target
Purity --- 99.8%,99.95%

Shape --- Disk, Plate, Plate, Sheet, Rod, Taper

Application - Media, TFR, Thin film capacitor

Barium Titanate Evaporation Material - BaTiO3
Purity --- 99.8%,99.95%

Melting point---1612 ℃

Theoretical density --- 6.06g/cm3

Shape --- 1-5mm,?0mm, piece

Application - Media, TFR, Thin film capacitor

Barium Titanate Powder - BaTiO3
Purity --- 99.8%,99.95%

Shape --- Powder


sputtering target, Barium Titanate (BaTiO3),

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China Rare Metal Material Co., Ltd

sputtering target,coating material,compound semiconductor materials,rare earth materials

Address: Unit 1208-1212,HongGu JingDian Building, No.1378 HongGu Avenue,,
Nanchang, Jiangxi
China, 330038

Tel: 0086-791-88101311
Fax: 0086-791-88101211

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